A Novel 1b Trench DRAM Cell With Raised Shallow Trench Isolation (RSTI)

التفاصيل البيبلوغرافية
العنوان: A Novel 1b Trench DRAM Cell With Raised Shallow Trench Isolation (RSTI)
المؤلفون: Alsmeier, J., Kelleher, K.H., Beintner, J., Haensch, W., Mandelman, J.A., Hoh, P., Ninomiya, Y.L., Srinivasan, S., Bronner, G.
المصدر: 1997 Symposium on VLSI Technology VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on. :19-20 1997
Relation: 1997 Symposium on VLSI Technology
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:4930813751
9784930813756
DOI:10.1109/VLSIT.1997.623674