Experimental confirmation of electron fluence driven, Cu catalyzed interface breakdown model for low-k TDDB

التفاصيل البيبلوغرافية
العنوان: Experimental confirmation of electron fluence driven, Cu catalyzed interface breakdown model for low-k TDDB
المؤلفون: Chen, Fen, Gambino, Jeffrey, Shinosky, Michael, Aitken, John, Huang, Elbert, Cohen, Stephan, Yang, Chih-Chao, Edelstein, Dan, Wang, Yun, Kane, Terry, Kioussis, Dimitri
المصدر: 2012 IEEE International Reliability Physics Symposium (IRPS) Reliability Physics Symposium (IRPS), 2012 IEEE International. :3A.3.1-3A.3.9 Apr, 2012
Relation: 2012 IEEE International Reliability Physics Symposium (IRPS)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781457716799
9781457716782
9781457716805
تدمد:15417026
19381891
DOI:10.1109/IRPS.2012.6241802