دورية أكاديمية

Assessment of Influence of Impedance Mismatch in ULSI Devices on Electromigration of Copper Interconnection Lines

التفاصيل البيبلوغرافية
العنوان: Assessment of Influence of Impedance Mismatch in ULSI Devices on Electromigration of Copper Interconnection Lines
المؤلفون: Livshits, P., Rysin, A., Sofer, S., Fefer, Y.
المصدر: IEEE Transactions on Device and Materials Reliability IEEE Trans. Device Mater. Relib. Device and Materials Reliability, IEEE Transactions on. 13(1):231-235 Mar, 2013
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
تدمد:15304388
15582574
DOI:10.1109/TDMR.2012.2236556