Optimized in situ rinsing for HF last processes

التفاصيل البيبلوغرافية
العنوان: Optimized in situ rinsing for HF last processes
المؤلفون: Wolke, K., Kubelbeck, A., Cornelissen, I., Meuris, M., Oshinowo, J.
المصدر: 1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023) Semiconductor manufacturing Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on. :P95-P98 1997
Relation: 1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780337522
9780780337527
DOI:10.1109/ISSM.1997.664633