دورية أكاديمية
Profiling of Channel-Hot-Carrier Stress-Induced Trap Distributions Along Channel and Gate Dielectric in High-$k$ Gated MOSFETs by a Modified Charge Pumping Technique
| العنوان: | Profiling of Channel-Hot-Carrier Stress-Induced Trap Distributions Along Channel and Gate Dielectric in High-$k$ Gated MOSFETs by a Modified Charge Pumping Technique |
|---|---|
| المؤلفون: | Lu, C.-C., Chang-Liao, K.-S., Tsao, C.-H., Wang, T.-K., Ko, H.-C., Hsu, Y.-T. |
| المصدر: | IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 61(4):936-942 Apr, 2014 |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | تدمد: | 00189383 15579646 |
|---|---|
| DOI: | 10.1109/TED.2014.2303885 |