Mechanistic understanding of mobility degradation on gate-last ZrO2 with medium thermal budget annealing

التفاصيل البيبلوغرافية
العنوان:	Mechanistic understanding of mobility degradation on gate-last ZrO2 with medium thermal budget annealing
المؤلفون:	Ngai, T., Clark, R. D., Veksler, D., Matthews, K., Bersch, E., Gilmer, D.C., Bersuker, G., Hill, R., Hobbs, C., Tapily, K., Wajda, C. S., Consiglio, S., Burroughs, T., Vivekanand, S., Kaushik, V., Leusink, G. J., Kirsch, P.D.
المصدر:	Proceedings of Technical Program - 2014 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) VLSI Technology, Systems and Application (VLSI-TSA), Proceedings of Technical Program - 2014 International Symposium on. :1-2 Apr, 2014
Relation:	2014 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)
قاعدة البيانات:	IEEE Xplore Digital Library