مؤتمر
Performance and reliability of sub-100 nm MOSFETs with ultra thin direct tunneling gate oxides
العنوان: | Performance and reliability of sub-100 nm MOSFETs with ultra thin direct tunneling gate oxides |
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المؤلفون: | Qi Xiang, Yeap, G., Bang, D., Miryeong Song, Ahmed, K., Ibok, E., Ming-Ren Lin |
المصدر: | 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216) VLSI technology VLSI Technology, 1998. Digest of Technical Papers. 1998 Symposium on. :160-161 1998 |
Relation: | 1998 Symposium on VLSI Technology Digest of Technical Papers |
قاعدة البيانات: | IEEE Xplore Digital Library |
ردمك: | 0780347706 9780780347700 |
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DOI: | 10.1109/VLSIT.1998.689240 |