مؤتمر
The Effect of the Effective Channel Length Induced by Plasma Etching
| العنوان: | The Effect of the Effective Channel Length Induced by Plasma Etching |
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| المؤلفون: | Yang, S.H., Lan, C.Y., Pang, S.L., Chang, B.J., Lu, K.L., Liu, J.S., Yang, J.J. |
| المصدر: | Proceedings of 1st International Symposium on Plasma Process-Induced Damage Plasma Process-Induced Damage, 1996 1st International Symposium on. :105-108 1996 |
| Relation: | 1st International Symposium on Plasma Process-Induced Damage |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0965157709 9780965157704 |
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| DOI: | 10.1109/PPID.1996.715213 |