التفاصيل البيبلوغرافية
| العنوان: |
PMMA removal selectivity to PS using dry etch approach for sub-10nm node applications |
| المؤلفون: |
Sarrazin, Aurelien, Pimenta-Barros, Patricia, Posseme, Nicolas, Barnola, Sebastien, Gharbi, Ahmed, Argoud, Maxime, Tiron, Raluca, Cardinaud, Christophe |
| المصدر: |
2015 China Semiconductor Technology International Conference Semiconductor Technology International Conference (CSTIC), 2015 China. :1-3 Mar, 2015 |
| Relation: |
2015 China Semiconductor Technology International Conference (CSTIC) |
| قاعدة البيانات: |
IEEE Xplore Digital Library |
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