AlGaN/GaN MOS-HEMTs with TiO2 gate dielectric by using non-vacuum ultrasonic spray pyrolysis deposition

التفاصيل البيبلوغرافية
العنوان: AlGaN/GaN MOS-HEMTs with TiO2 gate dielectric by using non-vacuum ultrasonic spray pyrolysis deposition
المؤلفون: Liu, H. Y., Lee, C. S., Hsu, W. C., Wu, T. T., Huang, H. S., Chen, S. F., Yang, Y. C., Chiang, B. C., Chang, H. C.
المصدر: 2015 IEEE 11th International Conference on Power Electronics and Drive Systems Power Electronics and Drive Systems (PEDS), 2015 IEEE 11th International Conference on. :578-580 Jun, 2015
Relation: 2015 IEEE 11th International Conference on Power Electronics and Drive Systems
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781479944026
تدمد:21645256
21645264
DOI:10.1109/PEDS.2015.7203398