Optical Lithography At Low /spl kappa/ Factors

التفاصيل البيبلوغرافية
العنوان: Optical Lithography At Low /spl kappa/ Factors
المؤلفون: Sewell, H.
المصدر: Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135) Microprocess and nanotechnology Microprocesses and Nanotechnology Conference, 1998 International. :97-97 1998
Relation: Microprocesses and Nanotechnology '98. 1998 International Microprocesses and Nanotechnology Conference
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:4930813832
9784930813831
DOI:10.1109/IMNC.1998.729988