التفاصيل البيبلوغرافية
| العنوان: |
Influence into platen and polishing pad surface temperature on removal rate in sapphire-chemical mechanical polishing |
| المؤلفون: |
Matsunaga, Takahiro, Uneda, Michio, Takahashi, Yoshihiro, Shibuya, Kazutaka, Nakamura, Yoshio, Ichikawa, Daizo, Ishikawa, Ken-ichi |
| المصدر: |
2015 International Conference on Planarization/CMP Technology (ICPT) Planarization/CMP Technology (ICPT), 2015 International Conference on. :1-4 Sep, 2015 |
| Relation: |
2015 International Conference on Planarization/CMP Technology (ICPT) |
| قاعدة البيانات: |
IEEE Xplore Digital Library |
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