مؤتمر
Modeling of cumulative thermo-mechanical stress (CTMS) produced by the shallow trench isolation process for 1 Gb DRAM and beyond
| العنوان: | Modeling of cumulative thermo-mechanical stress (CTMS) produced by the shallow trench isolation process for 1 Gb DRAM and beyond |
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| المؤلفون: | Tai-Kyung Kim, Do-Hyung Kim, Jae-Kwan Park, Tai-Su Park, Young-Kwan Park, Hoong-Joo Lee, Kang-Yoon Lee, Jeong-Taek Kong, Jong-Woo Park |
| المصدر: | International Electron Devices Meeting 1998. Technical Digest (Cat. No.98CH36217) Electron devices - IEDM 1998 Electron Devices Meeting, 1998. IEDM '98. Technical Digest., International. :145-148 1998 |
| Relation: | International Electron Devices Meeting 1998. Technical Digest |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0780347749 9780780347748 |
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| تدمد: | 01631918 |
| DOI: | 10.1109/IEDM.1998.746302 |