Development of 250W EUV light source for HVM lithography

التفاصيل البيبلوغرافية
العنوان: Development of 250W EUV light source for HVM lithography
المؤلفون: Mizoguchi, Hakaru, Nakarai, Hiroaki, Abe, Tamotsu, Nowak, Krzysztof M, Kawasuji, Yasufumi, Tanaka, Hiroshi, Watanabe, Yukio, Hori, Tsukasa, Kodama, Takeshi, Shiraishi, Yutaka, Yanagida, Tatsuya, Yamada, Tsuyoshi, Yamazaki, Taku, Okazaki, Shinji, Saitou, Takashi
المصدر: 2016 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2016 China. :1-4 Mar, 2016
Relation: 2016 China Semiconductor Technology International Conference (CSTIC)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781467388047
9781467388030
DOI:10.1109/CSTIC.2016.7463968