مؤتمر
Optimization of 28nm HK/MG single wafer cleaning process
| العنوان: | Optimization of 28nm HK/MG single wafer cleaning process |
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| المؤلفون: | Liang, Haihui, Liu, JiaLei, Liu, HuanXin, He, Yonggen, Wu, Jingang, Ge, Xiaojing, Haigermoser, Christian |
| المصدر: | 2016 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2016 China. :1-3 Mar, 2016 |
| Relation: | 2016 China Semiconductor Technology International Conference (CSTIC) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 9781467388047 9781467388030 |
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| DOI: | 10.1109/CSTIC.2016.7464007 |