مؤتمر
Reduction of "dark gate" defects in replacement-metal-gate process and middle-of-line contacts for advanced planar CMOS and FinFET technology
| العنوان: | Reduction of "dark gate" defects in replacement-metal-gate process and middle-of-line contacts for advanced planar CMOS and FinFET technology |
|---|---|
| المؤلفون: | Peng, Wen Pin, Chi, Min-hwa, Zhang, Yang, Derderian, Garo, Wahl, Jeremy, Hu, Yue, Liu, Yajiang, Wang, Haiting, Lemon, John, Wang, Tao, Mao, Jiwang, You, Shi |
| المصدر: | 2016 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2016 China. :1-4 Mar, 2016 |
| Relation: | 2016 China Semiconductor Technology International Conference (CSTIC) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 9781467388047 9781467388030 |
|---|---|
| DOI: | 10.1109/CSTIC.2016.7464045 |