Recent developments on PULSION® PIII tool: FinFET 3D doping, high temp implantation, III-V doping, contact and silicide improvement, & 450 mm

التفاصيل البيبلوغرافية
العنوان:	Recent developments on PULSION® PIII tool: FinFET 3D doping, high temp implantation, III-V doping, contact and silicide improvement, & 450 mm
المؤلفون:	Torregrosa, Frank, Spiegel, Yohann, Duchaine, Julien, Michel, Thomas, Borvon, Gael, Roux, Laurent
المصدر:	2015 15th International Workshop on Junction Technology (IWJT) Junction Technology (IWJT), 2015 15th International Workshop on. :1-5 Jun, 2015
Relation:	2015 15th International Workshop on Junction Technology (IWJT)
قاعدة البيانات:	IEEE Xplore Digital Library

الوصف
ردمك:	9784863485174
DOI:	10.1109/IWJT.2015.7467061