Rapid thermal annealing to significantly reduce delamination of silver thin film sputtered on silicon dioxide surface

التفاصيل البيبلوغرافية
العنوان: Rapid thermal annealing to significantly reduce delamination of silver thin film sputtered on silicon dioxide surface
المؤلفون: Neelakandan, Sivanantham, Chua, Peng Koon, Yeo, Kok Siong, Zhao, Bo, Tae, Veera Sae
المصدر: 2016 IEEE 18th Electronics Packaging Technology Conference (EPTC) Electronics Packaging Technology Conference (EPTC), 2016 IEEE 18th. :264-265 Nov, 2016
Relation: 2016 IEEE 18th Electronics Packaging Technology Conference (EPTC)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781509043699
9781509043682
DOI:10.1109/EPTC.2016.7861484