التفاصيل البيبلوغرافية
العنوان: |
Development of 250W EUV light source for HVM lithography |
المؤلفون: |
Yamazaki, Taku, Nakarai, Hiroaki, Abe, Tamotsu, Nowak, Krzysztof M, Kawasuji, Yasufumi, Okamoto, Takeshi, Tanaka, Hiroshi, Watanabe, Yukio, Hori, Tsukasa, Kodama, Takeshi, Yamagida, Tatsuya, Shiraishi, Yutaka, Saitou, Takashi, Mizoguchi, Hakaru |
المصدر: |
2017 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2017 China. :1-4 Mar, 2017 |
Relation: |
2017 China Semiconductor Technology International Conference (CSTIC) |
قاعدة البيانات: |
IEEE Xplore Digital Library |