Development of 250W EUV light source for HVM lithography

التفاصيل البيبلوغرافية
العنوان: Development of 250W EUV light source for HVM lithography
المؤلفون: Yamazaki, Taku, Nakarai, Hiroaki, Abe, Tamotsu, Nowak, Krzysztof M, Kawasuji, Yasufumi, Okamoto, Takeshi, Tanaka, Hiroshi, Watanabe, Yukio, Hori, Tsukasa, Kodama, Takeshi, Yamagida, Tatsuya, Shiraishi, Yutaka, Saitou, Takashi, Mizoguchi, Hakaru
المصدر: 2017 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2017 China. :1-4 Mar, 2017
Relation: 2017 China Semiconductor Technology International Conference (CSTIC)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781509066940
DOI:10.1109/CSTIC.2017.7919759