دورية أكاديمية

Activation Kinetics of the Boron–oxygen Defect in Compensated n- and p-type Silicon Studied by High-Injection Micro-Photoluminescence

التفاصيل البيبلوغرافية
العنوان: Activation Kinetics of the Boron–oxygen Defect in Compensated n- and p-type Silicon Studied by High-Injection Micro-Photoluminescence
المؤلفون: Sun, C., Nguyen, H.T., Sio, H.C., Rougieux, F.E., Macdonald, D.
المصدر: IEEE Journal of Photovoltaics IEEE J. Photovoltaics Photovoltaics, IEEE Journal of. 7(4):988-995 Jul, 2017
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
تدمد:21563381
21563403
DOI:10.1109/JPHOTOV.2017.2705420