Lower metal etching rate chemicals system for high reliability device & TSV without metal damage

التفاصيل البيبلوغرافية
العنوان: Lower metal etching rate chemicals system for high reliability device & TSV without metal damage
المؤلفون: Onishi, Tetsuya, Miyagawa, Tadayuki
المصدر: 2017 IMAPS Nordic Conference on Microelectronics Packaging (NordPac) Microelectronics Packaging (NordPac), 2017 IMAPS Nordic Conference on. :61-63 Jun, 2017
Relation: 2017 IMAPS Nordic Conference on Microelectronics Packaging (NordPac)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781538630556
DOI:10.1109/NORDPAC.2017.7993165