Uncovered the “hidden real defect” masked by “other anomaly seen” through deep dive FA in wafer fabrication

التفاصيل البيبلوغرافية
العنوان: Uncovered the “hidden real defect” masked by “other anomaly seen” through deep dive FA in wafer fabrication
المؤلفون: Teo, Angela, Peng, Ng Hui, Boon, Ang Ghim, Qing, Chen Chang, Yun, Xu Nai, Dayanand, N, Seng, Tam Yong, Hong, Mai Zhi, Lam, Jeffrey
المصدر: 2017 IEEE 24th International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA) Physical and Failure Analysis of Integrated Circuits (IPFA), 2017 IEEE 24th International Symposium on the. :1-5 Jul, 2017
Relation: 2017 IEEE 24th International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781538617793
9781538617786
تدمد:19461550
DOI:10.1109/IPFA.2017.8060215