Dual metal (DM) Insulated Shallow Extension (ISE) Gate All Around (GAA) MOSFET to reduce gate induced drain leakages (GIDL) for improved analog performance

التفاصيل البيبلوغرافية
العنوان: Dual metal (DM) Insulated Shallow Extension (ISE) Gate All Around (GAA) MOSFET to reduce gate induced drain leakages (GIDL) for improved analog performance
المؤلفون: Rewari, Sonam, Nath, Vandana, Haldar, Subhasis, Deswal, S. S., Gupta, R. S.
المصدر: 2017 Devices for Integrated Circuit (DevIC) Devices for Integrated Circuit (DevIC), 2017. :401-406 Mar, 2017
Relation: 2017 Devices for Integrated Circuit (DevIC)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781509047246
DOI:10.1109/DEVIC.2017.8073979