TCAD for gate stack optimization in pGaN Gate HEMT devices

التفاصيل البيبلوغرافية
العنوان: TCAD for gate stack optimization in pGaN Gate HEMT devices
المؤلفون: Jaud, M.-A., Baines, Y., Charles, M., Morvan, E., Scheiblin, P., Torres, A., Plissonnier, M., Barbe, J.-C.
المصدر: 2017 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) Simulation of Semiconductor Processes and Devices (SISPAD), 2017 International Conference on. :113-116 Sep, 2017
Relation: 2017 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9784863486119
9784863486126
9784863486102
تدمد:19461569
19461577
DOI:10.23919/SISPAD.2017.8085277