مؤتمر
Effect of energy reduction in sub-keV boron implantation on ultra-shallow junction formation
العنوان: | Effect of energy reduction in sub-keV boron implantation on ultra-shallow junction formation |
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المؤلفون: | Yasunaga, T., Matsuda, S., Shishiguchi, S., Saito, S. |
المصدر: | 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) Ion implantation technology Ion Implantation Technology Proceedings, 1998 International Conference on. 1:18-21 vol.1 1999 |
Relation: | 1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 |
قاعدة البيانات: | IEEE Xplore Digital Library |
ردمك: | 078034538X 9780780345386 |
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DOI: | 10.1109/IIT.1999.812041 |