Effect of energy reduction in sub-keV boron implantation on ultra-shallow junction formation

التفاصيل البيبلوغرافية
العنوان:	Effect of energy reduction in sub-keV boron implantation on ultra-shallow junction formation
المؤلفون:	Yasunaga, T., Matsuda, S., Shishiguchi, S., Saito, S.
المصدر:	1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) Ion implantation technology Ion Implantation Technology Proceedings, 1998 International Conference on. 1:18-21 vol.1 1999
Relation:	1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98
قاعدة البيانات:	IEEE Xplore Digital Library

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