مؤتمر
Suppression of abnormal oxidation of WSi/sub x//P-doped Si stack gate electrode during gate re-oxidation by additional nitrogen ion implantation
| العنوان: | Suppression of abnormal oxidation of WSi/sub x//P-doped Si stack gate electrode during gate re-oxidation by additional nitrogen ion implantation |
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| المؤلفون: | Hyeon-Soo Kim, Sang-Do Lee, Jeong-Youb Lee, Sang-Moo Lee, Kil-Ho Lee, In-Seok Yee, Sahng-Kyoo Lee |
| المصدر: | 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) Ion implantation technology Ion Implantation Technology Proceedings, 1998 International Conference on. 1:59-62 vol.1 1999 |
| Relation: | 1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 078034538X 9780780345386 |
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| DOI: | 10.1109/IIT.1999.812051 |