مؤتمر
CoSi/sub 2/ junction leakage with Ti or TiN capping, and device characteristics in embedded DRAM with stack capacitor
| العنوان: | CoSi/sub 2/ junction leakage with Ti or TiN capping, and device characteristics in embedded DRAM with stack capacitor |
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| المؤلفون: | Jong-Rim Lee, Soo-Mi Lee, Jong-Chae Kim, Wook-Ha Lee, Won-Suk Yang, Sang-Don Lee |
| المصدر: | ICVC '99. 6th International Conference on VLSI and CAD (Cat. No.99EX361) VLSI and CAD VLSI and CAD, 1999. ICVC '99. 6th International Conference on. :208-210 1999 |
| Relation: | ICVC'99. 6th International Conference on VLSI and CAD |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0780357272 9780780357273 |
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| DOI: | 10.1109/ICVC.1999.820878 |