مؤتمر
Copper dual damascene interconnects with low-K (K/sub eff/
| العنوان: | Copper dual damascene interconnects with low-K (K/sub eff/ |
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| المؤلفون: | Hasegawa, T., Ikeda, K., Tokunaga, K., Yamamura, I., Fukasawa, K., Kito, H., Miyata, K., Komai, N., Taguchi, M., Hirano, S., Tatsumi, T., Kadomura, S. |
| المصدر: | International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318) Electron devices Electron Devices Meeting, 1999. IEDM '99. Technical Digest. International. :623-626 1999 |
| Relation: | International Electron Devices Meeting 1999. Technical Digest |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0780354109 9780780354104 |
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| DOI: | 10.1109/IEDM.1999.824230 |