Co-silicide formation on silicon FEAs from Co, Co/Ti and Ti/Co layers

التفاصيل البيبلوغرافية
العنوان: Co-silicide formation on silicon FEAs from Co, Co/Ti and Ti/Co layers
المؤلفون: Byung Chang Shim, Byung-Gook Park, Jong Duk Lee
المصدر: International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318) Electron devices Electron Devices Meeting, 1999. IEDM '99. Technical Digest. International. :709-712 1999
Relation: International Electron Devices Meeting 1999. Technical Digest
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780354109
9780780354104
DOI:10.1109/IEDM.1999.824250