مؤتمر
A new deep reactive ion etching process by dual sidewall protection layer
| العنوان: | A new deep reactive ion etching process by dual sidewall protection layer |
|---|---|
| المؤلفون: | Ohara, J., Kano, K., Takeuchi, Y., Ohya, N., Otsuka, Y., Akita, S. |
| المصدر: | Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems (Cat. No.00CH36308) Micro electro mechanical systems Micro Electro Mechanical Systems, 2000. MEMS 2000. The Thirteenth Annual International Conference on. :277-282 2000 |
| Relation: | Proceedings IEEE Thirteenth Annual International Conference on Micro Electro Mechanical Systems |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0780352734 9780780352735 |
|---|---|
| تدمد: | 10846999 |
| DOI: | 10.1109/MEMSYS.2000.838529 |