دورية أكاديمية

Physical Analysis of Damage Sites Introduced by SEGR in Silicon Vertical Power MOSFETs and Implications for Postirradiation Gate-Stress Test

التفاصيل البيبلوغرافية
العنوان: Physical Analysis of Damage Sites Introduced by SEGR in Silicon Vertical Power MOSFETs and Implications for Postirradiation Gate-Stress Test
المؤلفون: Kuboyama, S., Mizuta, E., Nakada, Y., Shindou, H.
المصدر: IEEE Transactions on Nuclear Science IEEE Trans. Nucl. Sci. Nuclear Science, IEEE Transactions on. 66(7):1710-1714 Jul, 2019
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
تدمد:00189499
15581578
DOI:10.1109/TNS.2019.2902871