مؤتمر
Study of chamber history effect in oxide etcher
| العنوان: | Study of chamber history effect in oxide etcher |
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| المؤلفون: | Liao, C.H., Pang, S.L., Chang, B.J., Lu, K.L. |
| المصدر: | 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479) Plasma process-induced damage Plasma Process-Induced Damage, 2000 5th International Symposium on. :85-88 2000 |
| Relation: | 2000 5th International Symposium on Plasma Process-Induced Damage |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0965157741 9780965157742 |
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| DOI: | 10.1109/PPID.2000.870602 |