Sub-10 nm advanced finfet design for different applications in various vdd and temperature operation ranges

التفاصيل البيبلوغرافية
العنوان: Sub-10 nm advanced finfet design for different applications in various vdd and temperature operation ranges
المؤلفون: Kim, Soyoun, Kim, S.K., kim, J.C., Choi, B.H., Park, B.-G., Yasuda-Masuoka, Y., Kwon, S.D.
المصدر: 2019 Symposium on VLSI Technology VLSI Technology, 2019 Symposium on. :T108-T109 Jun, 2019
Relation: 2019 Symposium on VLSI Technology
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9784863487192
تدمد:21589682
DOI:10.23919/VLSIT.2019.8776531