التفاصيل البيبلوغرافية
| العنوان: |
Impact of Sacrificial Hard Mask Material in BEOL Integration in Advanced Technology |
| المؤلفون: |
Ramanathan, E., Jiang, L., Takmeel, Q., MaryClaire, S., Mahalingam, A.K.M., Ghosh, S., Donegan, K., Chandrasekar, A., Singh, S., Johanson, H., Damjanovic, D., Sun, Z., Sircar, A., Eah, S.-K., Bombardier, C., DaSilva, A., O'Brien, B., Roux, A., Cucci, B., Christopher, O., Montgomery, C., Venkatasubramanian, V., Rana, V., Mody, J., Shepard, J., Child, C., Morganfeld, B., Sheraw, R. |
| المصدر: |
2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) Advanced Semiconductor Manufacturing Conference (ASMC), 2019 30th Annual SEMI. :1-4 May, 2019 |
| Relation: |
2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) |
| قاعدة البيانات: |
IEEE Xplore Digital Library |
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