التفاصيل البيبلوغرافية
| العنوان: |
Fabrication of $\Omega$ -gated Negative Capacitance FinFETs and SRAM |
| المؤلفون: |
Sung, P.-J., Su, C.-J., Lu, D. D., Luo, S.-X., Kao, K.-H., Ciou, J.-Y., Jao, C.-Y., Hsu, H.-S., Wang, C.-J., Hong, T.-C., Liao, T.-H., Fang, C.-C., Wang, Y.-S., Huang, H.-F., Li, J.-H., Huang, Y.-C., Hsueh, F.-K., Wu, C.-T., Ma, W. C.-Y., Huang, K.-P., Lee, Y.-J., Chao, T.-S., Li, J.-Y., Wu, W.-F., Yeh, W.-K., Wang, Y.-H. |
| المصدر: |
2019 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) VLSI Technology, Systems and Application (VLSI-TSA), 2019 International Symposium on. :1-2 Apr, 2019 |
| Relation: |
2019 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) |
| قاعدة البيانات: |
IEEE Xplore Digital Library |
