مؤتمر
Boosting Ge-epi N-well Mobility with Sn Implantation and P-well Mobility with Cluster-C Implantation
| العنوان: | Boosting Ge-epi N-well Mobility with Sn Implantation and P-well Mobility with Cluster-C Implantation |
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| المؤلفون: | Borland, John, Chaung, Shang-Shiun, Tseng, Tseung-Yuen, Lee, Yao-Jen, Joshi, Abhijeet, Basol, Bulent, Kuroi, Takashi, Goodman, Gary, Khapochkima, Nadya, Buyuklimanli, Temel |
| المصدر: | 2018 22nd International Conference on Ion Implantation Technology (IIT) Ion Implantation Technology (IIT), 2018 22nd International Conference on. :101-105 Sep, 2018 |
| Relation: | 2018 22nd International Conference on Ion Implantation Technology (IIT) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
| ردمك: | 9781538668283 9781538668290 9781538668276 |
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| DOI: | 10.1109/IIT.2018.8807954 |