التفاصيل البيبلوغرافية
| العنوان: |
Defect Evaluation of O2-annealed TaOx for Transparent ReRAM with High Resistance Ratio $(R_{\mathrm{HRS}}/R_{\mathrm{LRS}}>10^{9}$ |
| المؤلفون: |
Doko, Soshun, Suda, Yoriko, Ishii, Yoshiaki, Moniwa, Masahiro |
| المصدر: |
2019 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) Electron Devices, Kansai (IMFEDK), 2019 IEEE International Meeting for Future of. :75-76 Nov, 2019 |
| Relation: |
2019 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) |
| قاعدة البيانات: |
IEEE Xplore Digital Library |
