مؤتمر
A 0.11 /spl mu/m CMOS technology with copper and very-low-k interconnects for high-performance system-on-a-chip cores
| العنوان: | A 0.11 /spl mu/m CMOS technology with copper and very-low-k interconnects for high-performance system-on-a-chip cores |
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| المؤلفون: | Takao, Y., Kudo, H., Mitani, J., Kotani, Y., Yamaguchi, S., Yoshie, K., Kawano, M., Nagano, T., Yamamura, I., Uematsu, M., Nagashima, N., Kadomura, S. |
| المصدر: | International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138) Electron devices meeting Electron Devices Meeting, 2000. IEDM '00. Technical Digest. International. :559-562 2000 |
| Relation: | International Electron Devices Meeting. Technical Digest. IEDM |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0780364384 9780780364387 |
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| DOI: | 10.1109/IEDM.2000.904381 |