مؤتمر
Improvement of Si/SiO/sub 2/ mask etching selectivity in the new D-RIE process
| العنوان: | Improvement of Si/SiO/sub 2/ mask etching selectivity in the new D-RIE process |
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| المؤلفون: | Ohara, J., Kano, K., Takeuchi, Y., Otsuka, Y. |
| المصدر: | Technical Digest. MEMS 2001. 14th IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.01CH37090) Micro electro mechanical systems Micro Electro Mechanical Systems, 2001. MEMS 2001. The 14th IEEE International Conference on. :76-79 2001 |
| Relation: | Technical Digest MEMS 2001 14th IEEE International Conference on Micro Electro Mechanical Systems |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0780359984 9780780359987 |
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| تدمد: | 10846999 |
| DOI: | 10.1109/MEMSYS.2001.906482 |