Effect Of The Etching Regimes On The Memristor Properties Of Al2O3 Thin Layers

التفاصيل البيبلوغرافية
العنوان: Effect Of The Etching Regimes On The Memristor Properties Of Al2O3 Thin Layers
المؤلفون: Rybina, Natalia V., Rybin, Nikolai B.
المصدر: 2020 30th International Conference Radioelektronika (RADIOELEKTRONIKA) Radioelektronika (RADIOELEKTRONIKA), 2020 30th International Conference. :1-4 Apr, 2020
Relation: 2020 30th International Conference Radioelektronika (RADIOELEKTRONIKA)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781728164694
9781728164687
DOI:10.1109/RADIOELEKTRONIKA49387.2020.9092408