مؤتمر
Effects of RTA and WSi/sub x/-polycide gate processes on MOSFET reliability for giga-bit scale DRAMs
| العنوان: | Effects of RTA and WSi/sub x/-polycide gate processes on MOSFET reliability for giga-bit scale DRAMs |
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| المؤلفون: | Donggun Park, Nak-Jin Son, Ji-Young Kim, Wonshik Lee |
| المصدر: | 2000 IEEE International Integrated Reliability Workshop Final Report (Cat. No.00TH8515) Integrated reliability workshop Integrated Reliability Workshop Final Report, 2000 IEEE International. :125-128 2000 |
| Relation: | 2000 IEEE International Integrated Reliability Workshop Final Report |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 0780363922 9780780363922 |
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| DOI: | 10.1109/IRWS.2000.911918 |