Effect of Dielectric Process on the Interfacial Adhesion of RDL for FOWLP

التفاصيل البيبلوغرافية
العنوان: Effect of Dielectric Process on the Interfacial Adhesion of RDL for FOWLP
المؤلفون: Son, Kirak, Kim, Gahui, Park, Young-Bae, Ryu, Hyun-Kyu
المصدر: 2020 IEEE 70th Electronic Components and Technology Conference (ECTC) Electronic Components and Technology Conference (ECTC), 2020 IEEE 70th. :348-353 Jun, 2020
Relation: 2020 IEEE 70th Electronic Components and Technology Conference (ECTC)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781728161808
تدمد:23775726
DOI:10.1109/ECTC32862.2020.00063