Steady-state, direct-current (DC) plasma immersion ion implantation (PIII) for planar samples

التفاصيل البيبلوغرافية
العنوان:	Steady-state, direct-current (DC) plasma immersion ion implantation (PIII) for planar samples
المؤلفون:	Xuchu Zeng, Kwok, D.T.K., Chu, P.K., Chung Chan, Cheung, N.W.
المصدر:	2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) Ion implantation technology Ion Implantation Technology, 2000. Conference on. :515-519 2000
Relation:	2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000
قاعدة البيانات:	IEEE Xplore Digital Library

الوصف
ردمك:	0780364627 9780780364622
DOI:	10.1109/IIT.2000.924201