دورية أكاديمية
Process and electrical (modulator) efficiency of plasma immersion ion implantation
العنوان: | Process and electrical (modulator) efficiency of plasma immersion ion implantation |
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المؤلفون: | Xiubo Tian, Xuchu Zeng, Chu, P.K. |
المصدر: | IEEE Transactions on Plasma Science IEEE Trans. Plasma Sci. Plasma Science, IEEE Transactions on. 29(3):529-535 Jun, 2001 |
قاعدة البيانات: | IEEE Xplore Digital Library |
تدمد: | 00933813 19399375 |
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DOI: | 10.1109/27.928952 |