Optimization of etching and stripping chemistries for Z3MS/sup TM/ Low-k

التفاصيل البيبلوغرافية
العنوان: Optimization of etching and stripping chemistries for Z3MS/sup TM/ Low-k
المؤلفون: Lepage, M., Shamiryan, D., Baklanov, M., Struyf, H., Mannaert, G., Vanhaelemeersch, S., Weidner, K., Meynen, H.
المصدر: Proceedings of the IEEE 2001 International Interconnect Technology Conference (Cat. No.01EX461) Interconnect technology conference Interconnect Technology Conference, 2001. Proceedings of the IEEE 2001 International. :174-176 2001
Relation: Proceedings of the IEEE 2001 International Interconnect Technology Conference
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780366786
9780780366787
DOI:10.1109/IITC.2001.930051