دورية أكاديمية
Suppression of Stress-Induced Defects in FinFET by Implantation and STI Co-Optimization
| العنوان: | Suppression of Stress-Induced Defects in FinFET by Implantation and STI Co-Optimization |
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| المؤلفون: | Ye, B., Zhu, H., Chen, L., Li, J., Sun, Q., Zhang, D.W. |
| المصدر: | IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 68(5):2587-2589 May, 2021 |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | تدمد: | 00189383 15579646 |
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| DOI: | 10.1109/TED.2021.3068241 |