دورية أكاديمية
Use of Plasma Information in Machine-Learning-Based Fault Detection and Classification for Advanced Equipment Control
العنوان: | Use of Plasma Information in Machine-Learning-Based Fault Detection and Classification for Advanced Equipment Control |
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المؤلفون: | Kim, D.H., Hong, S.J. |
المصدر: | IEEE Transactions on Semiconductor Manufacturing IEEE Trans. Semicond. Manufact. Semiconductor Manufacturing, IEEE Transactions on. 34(3):408-419 Aug, 2021 |
قاعدة البيانات: | IEEE Xplore Digital Library |
تدمد: | 08946507 15582345 |
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DOI: | 10.1109/TSM.2021.3079211 |