دورية أكاديمية

Use of Plasma Information in Machine-Learning-Based Fault Detection and Classification for Advanced Equipment Control

التفاصيل البيبلوغرافية
العنوان: Use of Plasma Information in Machine-Learning-Based Fault Detection and Classification for Advanced Equipment Control
المؤلفون: Kim, D.H., Hong, S.J.
المصدر: IEEE Transactions on Semiconductor Manufacturing IEEE Trans. Semicond. Manufact. Semiconductor Manufacturing, IEEE Transactions on. 34(3):408-419 Aug, 2021
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
تدمد:08946507
15582345
DOI:10.1109/TSM.2021.3079211