Comprehensive Comparison of Fabricated 1.6-kV Punch-Through Design Ni/n-SiC Schottky Barrier Diode with Ar+ Implant Edge Termination and Heterojunction p-NiO/n-SiC Diode

التفاصيل البيبلوغرافية
العنوان: Comprehensive Comparison of Fabricated 1.6-kV Punch-Through Design Ni/n-SiC Schottky Barrier Diode with Ar+ Implant Edge Termination and Heterojunction p-NiO/n-SiC Diode
المؤلفون: Shimbori, Atsushi, Wong, Hiu Yung, Huang, Alex Q.
المصدر: 2021 IEEE Latin America Electron Devices Conference (LAEDC) Electron Devices Conference (LAEDC), 2021 IEEE Latin America. :1-4 Apr, 2021
Relation: 2021 IEEE Latin America Electron Devices Conference (LAEDC)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781665415101
DOI:10.1109/LAEDC51812.2021.9437747