Exploring Gate-Cut Patterning Approaches Using Simulation and Defect Modelling

التفاصيل البيبلوغرافية
العنوان: Exploring Gate-Cut Patterning Approaches Using Simulation and Defect Modelling
المؤلفون: Fei, Sun Li, Peng, Wang Qing, Hong, Zhang Ji, Shan, Chi Yu
المصدر: 2021 China Semiconductor Technology International Conference (CSTIC) Semiconductor Technology International Conference (CSTIC), 2021 China. :1-4 Mar, 2021
Relation: 2021 China Semiconductor Technology International Conference (CSTIC)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781665449458
9781665449441
DOI:10.1109/CSTIC52283.2021.9461509